Suspension Plasma Spray System for Coating Semiconductor Etch Chambers
Home / Thermal Spraying Videos / Suspension Plasma Spray System for Coating Semiconductor Etch Chambers
When it comes to applying a coating to the walls of a semiconductor wafer etch chamber, the right thermal spray technique makes all the difference. The goal? To produce a smooth, dense ceramic coating that will positively impact chamber lifespan and maintenance costs. In this video we compare the strengths and weaknesses of various approaches and determine the most effective thermal spray process and equipment for the job.
Related Machines
CITS Pro® Computer Integrated Thermal Spray Systems
Process control, monitoring, and documentation for thermal spray.
Read More
Robotic Argon Atmosphere Thermal Spray with Airlock Exchange
Plasma spray booth eliminates oxygen without a vacuum.
Read More
Large Lathe HVOF Spray Cell with Sliding Roof
Easy loading of heavy parts by overhead crane.
Read More
Hydraulic Rod Grit Blast and HVOF Spray
Parts on special lathe move to 2-axis systems for grit blast operation and HVOF coating operation.
Read More